Method and apparatus for movement of workpieces in a plating machine



Oct. 4, 1966 R F. DOLAN ET IN A PLATING MACHINE TRANSFER MECHANISM STATION *I ENTRANCE TANK STATION 2 SOAK LEAN TANK STATION 3 ELECT. CLEAN TANK STATION *4 WARM RINSE STATION *5 COLD RINSE TANK STATION 6 ELECT ACID STATION 7 COLD RINSE STATION a COLD RINSE TANK STATION it 9 COPPER STRIKE TANK STATION Io COPPER PLATE TAN K STATION II RECLAIM RINSE TAN K STATION it I2 COLD RINSE TANK STATION 13 ELECT CLEAN STATION I4 COLD RINSE TAN K STATION l5 ACID DIP STATION l6 METHOD AND APPARATUS FOR MOVEMENT OF WORKPIECES 14 Sheets-Sheet l STATION IT IDLE TANK STATION T l8 DOUBLE NTCKEL.

STATION IS DOUBLE NICKEL STATION ED IDLE TANK STATION 2:

COLD RINSE STATION 22 TANK COLD RINSE STATION 23 TANK ACID STATION it 24 COLD RINSE TANK STATION 25 CHROME PLATE STATION 26 TANK RECLAIM RINSE STATION 27 TANK CHROME PLATE STATION it 28 TANK RECLAIM RINSE 1 STATION *29 COLD RINSE STATION 30 TANK HOT RINSE STATION 81 JNI/ENTORS DRY 9z%%aza ffid STATION 32 33 45 fr Wad/d! 1% ExIT r yfiygf ,4? gaazz/axfy COLD RIN S EJ ATYUR/VEY Oct. 4, 1966 R. F. DOLAN E L 3,275,983

METHOD AND APPARATUS FOR MOVEMENT OF WORKPIECES IN A PLATING MACHINE Filed July 25, 1962 I 14 Sheets-Sheet 2 N H 'J-{J- I Q\@ fi ATTORNEY R. F. DOLAN ET AL Oct. 4, 1966 3,276,983 METHOD AND APPARATUS FOR MOVEMENT OF WORKPIECES IN A PLATING MACHINE l4 Sheets-Sheec 5 Filed July 25, 1962 A "m W A SA A W 2 A m AZ W5? W 3% ARC Oct. 4, 1966 Filed July 25, 1962 R. F. DOLAN ET AL METHOD AND APPARATUS FOR MOVEMENT OF WORKPIECES IN A PLATING MACHINE 14 Sheets-Sheet 4 A TTOANEY' Oct. 4, 1966 R. F. DOLAN T AL 3,276,983

METHOD AND APPARATUS FOR MOVEMENT OF WORKPIECES IN A PLATING MACHINE Flled July 25, 1962 14 Sheets-Sheet 5 3,275,983 METHOD AND APPARATUS FOR MOVEMENT OF WORKPIECES Filed July 25, 1962 Oct. 4, 1966 R. F. DOLAN ET AL IN A PLATING MACHINE l4 Sheets-Sheet 6 q gar Quad/ @562"? 14 5,0011! 1239 Kg MM A T'TORNE Y R. F. DOLAN ETAL. 3,276,983 METHOD AND APPARATUS FOR MOVEMENT OF WORKPIECES Oct. 4, 1966 IN A PLATING MACHINE l4 Sheets-Sheet '7 Filed July 25, 1962 a 3d R W m 4%.

fi'oiai fl 5 2 4112 BY ATTORNEY Oct. 4, 1966 R. F. DOLAN ET AL 3,276,983

METHOD AND APPARATUS FOR MOVEMENT OF WORKPIECES IN A PLATING MACHINE Flled July 25, 1962 14 Sheets-Sheet 8 /f w W fir is? Oct. 4, 1966 R. F. DOLAN ET AL 3,276,983

METHOD AND APPARATUS FOR MOVEMENT OF WORKPIECBS IN A PLATING MACHINE Filed July 25, 1962 14 Sheets-Sheet 9 Oct. 4, 1966 R. F. DOLAN ET Al. 3,276,983

METHOD AND APPARATUS FOR MOVEMENT OF WORKPIECES IN A PLATING MACHINE Filed July 25, 1962 14 Sheets-Sheet 10 &

45%; iii/2V MENTOR/S 2Q. Z/Mm ATTORNEY 3,2 76,983 PIECES l4 Sheets-Sheet 1 1 ATTORNEY? L E Am H m NM m on F.A Rm

Oct. 4, 1966 METHOD AND APPARATUS FOR MOVEMENT OF WORK Filed July 25, 1962 Oct. 4, 1966 R. F. DOLAN ET AL METHOD AND APPARATUS FOR MOVEMENT OF WORK 3,2 76,83 PIECES IN A PLATING MACHINE l4 Sheets-Sheet 12 Filed July 25, 1962 11V VENTO/RS' ELECT. CLEAN 3 WARM RINSE COPPER STRIKE 9 COPPER PLATE IO RECLAIM RINSE COLD RINSE a E 5 WE R m Ml R LD C L Rm ELECT. CLEAN I3 DOUBLE NICKEL I8 DOUBLE NICKEL I9 IDLE EE MST LW PRM E M W W RQR HEH CRC COLD RINSE IDLE COLD RINSE COLD RINSE ACID COLD RINSE E S W R T O H 27/ div flwa 1 My, w ,co 2% m DRY EXIT

A T T ORA KY9 Oct. 4, 1966 R. F. DOLAN ET AL 3,276,983

METHOD AND APPARATUS FOR MOVEMENT OF WORKPIECES IN A PLATING MACHINE w M Zw pizza J? Jpn/M2 BY AJTOfQ/VEY Oct. 4, 1966 R. F. DOLAN ET AL 3,276,983

METHOD AND APPARATUS FOR MOVEMENT OF WORKPIECES IN A PLATING MACHINE Filed July 25, 1962 14 Sheets-Sheet l4.

ATTORNEY United States Patent METHOD AND APPARATUS FOR MOVEMENT 0F WORKPIECES IN A PLATING MACHINE Richard F. Dolan, Mount Clemens, Edgar R. Powell, Royal Oak, and Robert A. Spaulding, Huntington Woods, Mich assignors to General Motors Corporation, Detroit, Mich, a corporation of Delaware Filed July 25, 1962, Ser. No. 212,319 13 Claims. (Cl. 204198) This invention relates to a plating method and apparatus, and more particularly to an electrolytic plating method and apparatus in which workpieces are automatically transported to successive work stations to have various plating operations performed thereon. The invention is specifically directed to a widely variable and easily modifiable means for rapidly shuttling parts through a series of processing stations in a plating machine in which a workpiece carrier forms at least a part of a plating cell.

Automatic electroplating machines commonly have a plurality of preparation tanks containing solutions in which articles to be plated are immersed for cleaning, rinsing, etching and similar treatments. In addition, plating tanks and finishing tanks for reclaim operations or the like are provided. In conventional construction, such machines are provided with workpiece carriers adapted to carry multiple workpieces and to be advanced from tank to tank in a series of steps by suitable conveyor mechanism. Elevator mechanism operating in timed relation with the conveyor mechanism is also provided to raise and lower the carriers within each individual tank. The workpiece carriers generally comprise rack-type construction on which a plurality of individual workpieces are supported. Often, as many as ten or more parts are supported on a single carrier. Thus, racks supporting a plurality of individual articles are moved from tank to tank by the conveyor mechanism and raised and lowered at each tank by the elevator mechanism to immerse the articles in the tanks. It is conventional practice to space the tanks so that a plurality of workpiece carriers can be advanced from one tank to the next on successive movements of a step by step type conveyor. The plating operation is conventionally carried on in large tanks adapted to simultaneously contain a plurality of immersed workpiece carriers which may remain immersed during movement thereof by the conveyor from one end of a plating tank to the other.

The utilization of large tanks for immersing a plurality of workpiece carriers or even a plurality of workpieces on a single carrier has inherent disadvantages. In particular, a uniform plating thickness on a particular workpiece and between workpieces on a carrier is extremely difiicult to obtain. One of the reasons that the thickness of the plating is not uniform is the difiiculty of locating anodes equal distances from all of the parts immersed in the tank. When the workpieces are of intricate configuration the problem of uniform anode spacing is particularly acute. In addition, it is also dilficult to obtain uniform and accurate plating thicknesses because of variations in process solution contact with particular workpieces. The lack of uniformity of solution contact is due to the fact that many parts are supported on a particular carrier with resultant variations in spacing of each part from the other parts, the racks, the anode and the sides of the tank. Most articles having intricate shapes or even simple curves cannot be plated properly during movement through a plating tank because the anodes must be positioned to permit movement of the articles through the tank. Consequently, all portions of the articles have a diiferent spacing from the anodes. As previously disice cussed, the variation in spacing of the articles will be sufficient to produce variations in plating thickness.

Automobile bumper bars are typical of articles which cannot be satisfactorily plated while being moved through a plating bath, and such articles are conventionally plated in machines which lower the articles into a tank where they are immersed for treatment. In such machines, the plating is carried on at a number of treatment positions in one or more tanks. At each position a group of anodes are placed within the tank so that a workpiece carrier may be lowered to immerse a plurality of workpieces in a plating solution in a particular spatial relationship with the anodes to better control the positioning of the workpieces relative thereto. However, in order to maintain high production volumes during the plating operation, many workpieces must be mounted on a particular workpiece carrier. Due to variations in the spacing between individual workpieces and the workpiece carrier, it is impossible to arrange the anodes so that they are equally spaced from all portions of a particular workpiece and from all portions of similar workpieces. Although the amount of variation in plating thickness may be reduced by the tank immersion method, a high proportion of parts are substandard because of considerable variations in plating thickness. In the tank immersion machine the workpiece carriers are delivered to and removed from the processing tanks by a conveyor and an elevator as previously described. In order to increase rate of production, the carriers are generally advanced to and positioned in the tanks in groups. In tank immersion plating machines of this type, the overall lengths of the plating tanks are extreme. A substantial increase in plating rate with this type of machine concurrently involves incidental undesirable results. Hence, such increases are impractical.

A principal object of this invention is to provide a high production, in-line type, metal finishing machine which is capable of treating parts, such as automobile bumpers,

at high volumes under commercial production conditions. It is a further object to provide a readily flexible apparatus and process for rapidly transferring articles from one station to another in .a treatment machine, such as an in-line plating machine, in which a workpiece carrier forms at least a part of a plating cell.

In general, the aforementioned objects of this invention are accomplished by the use of a palletized plating fixture for individual parts, which is movable on conveyor means between a plurality of processing stations at which particular plating processes are performed with' in a plating cell formed thereat. The fixture is shuttled from station to station by means of a multiple transfer bar arrangement. Reciprocating longitudinal movement of two pairs of transfer bars along with appropriate axial rotation of the bars effects fixture movement. With the relative distance of longitudinal movement of one of the pairs being twice that of the other, a fixture can be moved a single or double increment. Removable dogs on the transfer bars permit adaptation of the mechanism to produce a double transfer of a fixture at any point to skip a station or permit .a fixture to remain at a single station for more than one processing period. Precise relative movement of the bar pairs is .attained by a rack and pinion interconnection in which movement of one pair a given distance inherently moves the other pair a distance proportional by the rack and pinion interconnection.

The transfer mechanism is particularly adapted to move workpieces through a long, in-line, metal finishing machine in which workpieces are supported on a part of a treatment cell. The cell part is successively moved into engagement with a plurality of similar other cell parts, each of which forms a complete cell with the support cell part, to perform various treatments on the workpiece. The support part can be a palletized plating fixture.

The palletized plating fixture is designed to accommodate individual workpieces and to retain the individual w-orkpices in a predetermined position throughout the plating process. Individual workpieces are supported during each portion of plating operation within individual plating cells to which various plating solutions and plating preparation solutions may be alternately apphed without removal of the workpiece from the particular palletized plating fixture within which it is originally received. The use of large tanks to immerse parts to be plated is entirely eliminated and mechanism requiredfor elevating workpieces int-o and out of solution tanks is also entirely eliminated. The prior commercially available part conveying apparatus, requiring immersion of workpieces within particular tanks, is replaced so that the necessary operations are perfiormed within individual plating cells at each of the work stations. In this manner, cleaning solutions and plating solutions are forced through the plating cell at the various stations without any repositioning of the workpiece relative to its initial position in the palletized plating fixture. A predetermined spatial relationship between anode means and each workpiece is maintained throughout the plating process. The individual palletized plating fixtures are moved from station to station to subject each workpiece to a variety of plating processes in the manner previously indicated.

Other objects, features and advantages will become more apparent from the following detailed description andgfrom the drawings, in which:

FIGURE 1 shows a diagrammatic View of an illustrative plating process station sequence for copper, nickel and chrome plating an automobile bumper part or the like;

FIGURE 2 contains a side elevational view of a portion of a plating machine embodying individual plating process stations shown in FIGURE 1;

FIGURE 3 shows a plan View, partly in section, of the portion of the plating machine shown in FIGURE 2 and taken along the line =34;

FIGURE 4 shows a cross-sectional view taken along the line 44 in FIGURE 2;

FIGURE 5 contains an enlarged cross-sectional view taken along the line 5--5 in FIGURE 2;

FIGURE 5a shows a schematic elevational view in perspective of the conveyor frame section and associated housing shown in FIGURE 5;

FIGURE 6 also contains an enlarged cross-sectional view. This view shows the conveyor driven mechanism provided for the machine taken along the line 6-6 in FIGURE 3;

FIGURE 7 shows an enlarged cross-sectional view of the conveyor mechanism taken along the line 77 in FIGURE 6;

FIGURE 8 illustrates a detail plan view, partly in section, of a portion of the conveyor mechanism shown in FIGURE 6;

FIGURE 9 shows a cross-sectional view taken along the line 99 in FIGURE 7;

FIGURE 10 shows a cross-sectional view taken along the line 10-10 in FIGURE 8;

FIGURE 11 shows a cross-sectional view taken along the line 11-11 in 'FIGURE 7;

:FIGURE 12 shows an enlarged sectional partial View of a palletized plating fixture in processing position as shown at station 2 in FIGURE 2;

FIGURE 13 also has an enlarged cross-sectional view of a plating cell formed at station 2 in FIGURE 2;

FIGURE 14 contains a cross-sectional view of a portion of the apparatus shown in FIGURE 13 and taken along the line 14-14 in FIGURE 13;

FIGURE 15 illustrates a cross-sectional view of a 1 4 portion of the apparatus shown in FIGURE 13 and taken along the line 15-15;

FIGURE 16 shows a cross-sectional view taken along the line 16-16 and showing a portion of the apparatus in FIGURE 13;

FIGURE 17 shows a cross-sectional view of a portion of the apparatus shown in FIGURE 13 and taken along the line 1717;

FIGURE 18 diagrammatically illustrates the method of transferring palletized plating cells firom station to station:

FIGURE 19 diagrammatically illustrates the method of transferring palletized plating cells from station to station;

FIGURE 20 contains a plan view of a pallet for a plating cell;

FIGURE 21 illustrates an enlarged sectional view of a portion of the apparatus shown in FIGURE 5 and taken along the line 21'21; and

FIGURE 22 shows a cross-sectional view of an alternative embodiment of the cathode fixture shown in FIG- URE 1-3.

In general, the present invention comprises the provision of a plating machine having a plurality of aligned processing stations through which a palletized plating fixture is to be moved by new transfer means provided on the machine. Processing means are provided at each of the stations to direct plating solution, cleansing solution or other processing materials into processing contact with an individual workpiece mounted in each of the palletized plating fixtures. At some stations a plating cell is formed by association of an anode fixture with the palletized plating fixture to form a sealed cell in which electrolytic processing can be accomplished. In order to minimize the number of anode fixtures required, other types of fixtures, for forming a sealed cell, are provided at certain processing stations where non-electrical processing is accomplished. Thus, instead of providing a single palletized plating cell of anode type construction, which would be moved from station to station; the preferred embodiment of this invention comprises a palletized plating fixture associated with various cover fixtures at the difierent processing stations to form various types of processing cells depending on the processing operation at a particular station. In the apparatus shown for illustrative purposes, thirty-two working stations are provided. However, it is to be understood that the number of processing stations may be varied and the position of various staitons relative to one another may also be varied depending on the particular workpiece being processed, and on the particular type and sequence of processing desired to be applied to a particular workpiece or part. A sufiicient number of palletized plating fixtures are utilized to provide a plating cell for each of the work stations when the machine is in operation and to provide a sufiicient number of palletized plating fixtures in addition to the number of work stations so that a continuous plating operation may be maintained. In other words, several palletized plating fixtures at any particular time in the complete plating cycle will be in the process of having the work-1 piece contained therein under load subsequent to the platmg operation and loaded prior to re-entry into the plating machine to begin another plating process. Conveyor means are provided to carry each palletized plating fixture,

from the final station of the plating machine to an unloadin-g station whereat an operator, or suitable automatic mechanism, may be utilized to remove the finished workpiece; and whereat, another workpiece may be mounted on the palletized plating fixture. The conveyor mechanism thereafter carries the palletized plat-ing cell from the loading station to the first station of the machine whereat the palletized plating fixtures are fed onto a pallet conveyor mechanism which is actuable to move the palletized plating fixtures step by step from station to station. In some cases, the normal step by step movement of the palletized plating fixtures between successive stations is changed so that a station may be skipped or the formation of a cell at a particular station may be maintained for longer than a standard or normal processing period between transfer movement. In this manner, stations which require a longer processing time, compared to the other stations, may be accommodated without disrupting a standard stop period between transfer movement. The particular process solutions at each station are pumped or otherwise delivered under pressure within the processing cell formed thereat to contact the workpiece carried 'by the palletized plating fixture in a predetermined manner and to accomplish a predetermined result during the standard stop time. At each work station, a particular process solution is applied to the part within the plating cell and subsequently removed from the plating cell before the palletized plating fixture is transferred to the next work station. A plurality of tanks are provided adjacent each work station and suitable pumping means may be provided to convey the fluid from the tanks to the plating cells. In addition, at some stations, a processing material such as rinse water is applied from a central source through retractable shroud housing type fixtures provided at such working stations to form a processing cell with the palletized plating fixture. Suitable tanks are provided below the processing cell to collect rinse water or the like delivered through the retractable heads. The processing cycle is arranged so that suitable rinsing stations separate processing stations in which activated processing solutions are used. In this manner, the palletized plating fixtures are completely washed and cleansed between applications of plating solutions so that a solution applied at a particular station is completely washed or rinsed away before the palletized plating fixture arrives at another plating or similar process station. The operation of the machine is continuous and the different process solutions are applied to the individual parts supported within the processing cells in a manner in which the application of plating solution to the individual workpiece can be rigidly controlled and in which the position of an anode fixture relative to the surface of the workpiece to be plated is also rigidly controlled and maintained. The capacity of the machine is limited only by the time each individual workpiece must remain at a particular processing station. In order to increase the plating rate of the machine as a whole, special methods of applying the plating solutions are provided which increase the plating rate substantially relative to previously known methods of plating similar parts on a mass production basis. In this manner, although individual workpieces are plated as compared to plating of a multiplicity of workpieces at a particular station as known in the prior art, the plating rate capable of being achieved with the machine and methods provided by this invention is greatly increased over the plating rate which could be achieved in previous apparatus. In addition, plating quality is also increased. The control of the plating cycle is facilitated by providing work stations that are equally spaced from one another and by providing equal stop intervals for the palletized plating cells at each of the work stations. In general, each of the palletized plating fixtures is moved an equal distance between each station and remains at each station an equal time. Any necessary deviations from the standard stop time are accommodated by the special transfer mechanism provided which permits an increased process time at particular process stations, such as a plating station, without disrupting the continuous overall operation of the machine.

The following serves as a specific example of the invention. It includes a description of a plating machine and its manner of operation. The plating process hereinafter described relates to general process requirements since many of the component processes of the complete plating system are variable and dependent on the particular part being processed and the particular result desired. However, it is to be noted that unusually high current densities can be used to obtain a satisfactory decorative electrodeposit having an extremely uniform thickness in a very short period of time. For purposes of illustration, a standard 30 second dwell, or stop, time is specified for the palletized plating fixture at each station and a standard transfer time of 8 seconds between stations is utilized. It is to be noted that the operation of the machine is very fiexible and other time intervals may be used as desired. The processing sequence for a single workpiece on a single palletized plating fixture is shown in FIGURE 1.

A preferred plating process is embodied in a machine comprising thirty-two separate in-line stations and transfer mechanism to successively move individual palletized plating fixtures from station to station. As shown in FIGURE 1, several of the stations are provided with individual solution tanks from which various process solutions are applied to processing cells formed by association of cover heads at each station with the palletized plating fixtures. The process sequence for a particular part comprises the preliminary steps of loading the part or workpiece on a cathode mounting fixture which is associated with a pallet to form a palletized plating fixture, and moving the palletized plating fixture to machine entrance station No. 1 whereat the palletized plating fixture is associated with transfer mechanism which controls movement of the palletized plating fixtures from station to station through the machine. As previously discussed, an individual palletized plating fixture will be located at each processing station during normal full scale production runs. The transfer mechanism moves each individual palletized plating fixture simultaneously from station to station and a standard stop time is utilized for forming a processing cell and applying processing solution at each station. After a palletized plating cell has been loaded with a part and positioned at entrance station No. 1 during a standard stop time, the next movement of the transfer mechanism carries the loaded palletized plating cell from station 1 to cleaning station 2. When the palletized plating cell is in position at station No. 2, a shroud housing is positioned around the workpiece and a cleansing solution is pumped from an adjacent tank to spray apparatus in the shroud housing from which the cleansing solution is sprayed over the workpiece. The cleansing solution flows over the workpiece and returns to the tank through a drain opening extending through the palletized plating fixture and a collection sink provided thereunder. The application of the cleansing solution is completed within the standard stop time and the shroud housing is disassociated from the palletized plating fixture before the next movement of the transfer mechanism which carries the palletized plating fixture from station No. 2 to electrical cleansing station No. 3. The apparatus provided at station No. 2 and the operation thereof is similar to the apparatus provided at stations Nos. 4, 5, 7, 8, 11, 12, .14, =15, 16, '21, 12, 23, 24, 26, 28, 29, 30 and 31. Therefore, only the process variations are hereinafter described in detail.

' After the palletized plating fixture is properly positioned at station No. 3, an anode housing is positioned in sealing engagement therewith to form a processing cell andthe palletized plating fixture is simultaneously positioned in sealed engagement with a solution applying passage and a solution receiving sink. At the same time, an electrical connection is obtained between the cathode mounting fixture and an electrical source provided at station No. 3. The anode fixture may be permanently electrically connected since it is permanently located at station No. 3. Cleansing solution is then pumped at a high rate of flow from an adjacent tank through the solution applying passage and into a flow cavity formed between a contoured lower surface of anode fixture within the anode housing and "a parallel closely spaced surface of the workpiece on the palletized plating fixture. The flow cavity encompasses the entire surface to be plated of the workpiece and the cleansing solution flows completely over the outer surface of the workpiece. The anode fixture is electrically energized and the workpiece is electrically energized through contact with the cathode mounting fixture during the cleansing process. The cleansing solution flows through an outlet port extending between the palletized plating fixture and the solution receiving sink to the adjacent tank. At the end of the solution applying cycle and before the elapse of the standard stop time, the pumping of cleansing solution is discontinued and the palletized plating fixture is disengaged from the solution applying passage, the solution receiving sink, the electrical source and the anode housing to prepare the palletized plating fixture for transfer to the next station when the standard stop time has elapsed. It is to be understood that the shroud housings and anode housings at the various stations are simultaneously raised and lowered during the standard stop time and therefore no further reference to the positioning of the housing need'to be made in this brief description of the processing steps. The apparatus provided at station No. 3 and the operation thereof is similar to the apparatus provided at the subsequent electrical processing stations Nos. 6, 9, .10, 13, 18, 19, 25 and 27 whereat anode housings are provided. Accordingly, only the process variations are hereinafter described in detail. The next movement of the transfer mechanism carries the palletized plating fixture from Station No. 3 to Warm rinsing station No. 4. At station No. 4 a shroud housing is associated with the palletized plating fixture. Warm rinsing solution is pumped from an adjacent tank containing a heating element and applied to the Workpiece. Before the stop time elapses, the solution application is "discontinued and the shroud housing is dis-associated from the plating fixture. The next movement of the transfer mechanism carries the palletized plating fixture from station No. 4 to cold rinsing station No. 5. Station No. 5 is identical to station No. 4 except that the solution is maintained at a lower temperature. The cold rinse solution may be supplied directly from a central water source and drained to a sewer connection rather than being pumped from and collected in an adjacent tank as at station No. 2. The processing at stations 7, 8, 12, 16, 21, 22, 24 and 29 is similar.

At station No. 6, an anode housing is associated with the palletized plating fixture and an acid solution of suitable composition is applied to the workpiece at a suitable rate of flow and current density.

The palletized plating fixture then passes through successive cold rinse stations Nos. 7 and 8 which are provided to insure a thorough removal of the cleansing .acid applied to the palletized plating fixture at station No. 6 Without disrupting the standard stop time. In other words, when a longer processing time is required than the standard stop time, a plurality of similar stations may be provided to enable the application of processing solution for the required processing time without unnecessarily increasing the stop time at other processing stations which require a lesser processing time.

Station No; 9 is a copper strike station whereat a proc essing solution of suitable composition is applied at a suitable flow rate and current density.

Station 10 is a copper plate station whereat the workpiece is copper plated by the application of a processing solution of suitable composition at a suitable flow rate and current density.

Station 11 is a reclaim rinse station whereat copper is reclaimed from the rinse solution.

After a cold rinse at station No. 14, the palletized plating fixture is moved to acid dip station No. .15 whereat an acid solution of suitable composition is sprayed over the workpiece to additionally clean the copper plated workpiece.

After a cold rinse at station No. 16 to remove acid, the palletized plating cell is moved to either station No. 17 or No. 18 depending on whether station No. 17 is empty.

Thus, by the provision of another idle station N0. 20, the palletized plating cells can remain at stations Nos. 18 and 19 for two standard stop periods and each palletized plating cell stops only at one or the other of stations 18 and 19. At nickel plating stations Nos. 18 and 19, a nickel plating solution of suitable composition is applied to the workpieces at a suitable flow rate and current density for a suitable period of time.

The palletized plating fixture is next moved to cold rinse station No. 21 from station No. 19 or from idle station No. 20 depending on the machine cycle. A second cold rinse station No. 22 insures complete rinsing of the nickel plating solution.

An acid solution of suitable composition is applied to the nickel plated workpiece at station No. 23 to prepare the nickel surface fora chrome plating operation. The acid is Washed away at station No. 24.

The chrome plate is applied at stations Nos. 25 and 27 at suitable flow rates and current densities. Some of the chrome plating solution is reclaimed at rinse stations Nos. 26 and 28.

The chrome plated workpiece is then washed and rinsed at rinse stations Nos. 29 and 30, and dried at station No. 31 prior to association of the palletized plating fixture with overhead conveyor means or the like at'exit station No. 32 for movement of the palletized plating fixture to an unloading station and thereafter to the loading station and back to station No. 1 as previously described.

In summation and by way of further detail, the process shown in FIGURE 1 has been practiced on the left corner bar, or wing, of the 1961 Chevrolet from bumper. The conforming anode used in treating this part is spaced approximately one-half inch from the surface of the wing to form a rather extended treatment chamber therebetween. As previously indicated,.the solution used to treat the part is passed in one end of the chamber and out the other. The velocity of the solution flowing through the chamber in this manner is equal to about 7.1 feet per second for each 100 gallons being pumped through per minute (g.p.m.). Hence, for a rate of flow of 200 g.p.m. the solution velocity in the chamber is about 14.2 feet per second, for 400 g.p.m. the solution velocity is about 28.4 feet per second, for 600 g.p.m. the solution velocity in the chamber is about 42.6 feet per second, etc. Thus, the process shown in FIGURE 1 also involves:

STATION 1 An automatic loading station whereat the palletized plating fixture is automatically loaded on the machine transfer mechanism.

STATION 2 A spray cleaning station whereat foreign matter, such as oil, dirt, bufiing compound, etc., on the surface of the part to be plated is removed. The cleaning solution applied will usually be an alkaline type of cleaner of conventional composition comprising alkali, such as caustic soda, phosphate, carbonate, etc., emulsifiers, wetting agents and other soil removing aids. The stop interval 'is'30 seconds and the cleaning solution is pumped to the part at a rate of approximately 200 g.p.m. at a temperature of approximately between F. and 200 F.

STATION 3 9 STATION 4 STATION 5 A cold water rinse station whereat additional residual alkalies are removed from the part by spraying tap water at line pressure over the part. The stop interval is 30 seconds.

STATION 6 An electrolytic acid station which may be optionally used as an acid dip to neutralize any residual alkaline film or as an electrolytic acid for electrolytic polishing of the part. Sulfuric acid or other suitable acid solution, which may vary from less than 1% to more than 50% concentration, is used in our preferred process. It is pumped to the part at an approximate rate of 300 gallons per minute and an approximate temperature of 75 F. to 200 F. A current density, anodic or cathodic, of about a.s.f. can be concurrently imposed on the part. This station can also be used for electropolishing, if desired. The stop interval is 30 seconds.

STATIONS 7 AND 8 Cold rinse stations whereat any residual acid solution is removed by tap water at line pressure. The stop interval is 30 seconds at each station.

STATION 9 A copper strike station whereat a flash of copper is deposited on the part to provide a base for subsequent operations that will promote adhesion. A conventional cyanide copper solution is pumped to the part at an approximate rate of 600 gpm. and at an approximate temperature of between 100 F. and 200 F. The part is electrified. The stop interval is 30 seconds.

STATION 10 A copper plate station whereat suflicient copper is deposited to provide a suitable susrface for subsequent deposite dto provide a suitable surface and may be cathodic or periodic reverse plating may be used. The solution is pumped to the part at an approximate rate of 600 gallons per minute and at a temperature of approximately 120 F. to 190 F. The stop interval is 30 seconds.

STATIONS 11 AND 12 Cold water rinse stations whereat any cyanide alkaline film residue on the part is removed by tap water pumped at an approximate rate of 100 gallons per minute. The stop intervale is 30 seconds at each station.

STATION 13 An electrolytic cleaning station which provides a supplementary cleaning to insure a clean surface prior to nickel plating. The part is electrified and an alkaline type cleaning solution is pumped to the part at a rate of approximately 300 gallons per minute and at a temperature of approximately 150 F. to 200 F. The stop interval is 30 seconds.

STATION 14 A cold water rinse station identical to station 5.

STATION 15 An acid cleaning station whereat any alkaline film residue remaining from station 13 is removed. An acid solution of sulfuric acid, hydrochloric acid, or any other suitable acid, is pumped to the part at an approximate rate of 100 gallons per minute and at approximately room temperature to 200 F. The stop interval is 30 seconds.

10 STATION 16 A cold Water rinse station identical to station 7.

STATION 17 An idle station whereat the part may be located for a stop interval of 30 seconds without any processing to accommodate a stop interval of 60 seconds at stations 18 and 19.

STATIONS 18 AND 19 STATION 20 An idle station to accommodate stop intervals of 60 seconds at station 18 and 19.

STATIONS 21 AND 22 Cold water rinse stations whereat residual nickel plating solution on the part is removed by tap water sprayed thereon at an approximate rate of gallons per minute. The stop interval is 30 seconds.

STATION 23 An acid dip station, whereat the nickel surface on the part is activated prior to chromium plating by application of an acid solution, such as sulfuric acid, and other conventional additives which form an activated nickel surface. The acid solution is sprayed over the part at an approximate rate of 100 gallons per minute at room temperature. The stop interval is 30 seconds.

STATION 24 A cold Water rinse station, whereat residual acid solution is removed. The station is identical to station 5.

STATION 25 A chromium plating station, whereat the chromium plating solution is pumped over the part at approximately 400 gallons per minute and at an approximate temperature of 100 F. to 200 F. The part is cathodically energized. The stop interval is 30 seconds.

STATION 26 A reclaim rinse station, whereat residual chromium plating solution adhering to the part is removed by room temperature rinse water that is reclaimed. The stop interval is 30 seconds.

' STATION 27 A chromium plating station identical to station 25.

STATIONS 28 AND 29 Cold water rinse stations whereat residual chromium plating solution is removed. The stations are identical to station 11.

STATION 30 A hot water rinse station whereat the rinse water is heated to an approximate temperature of F. to facilitate subsequent drying of the part. The station is otherwise identical to stations 23 and 29.

STATION 31 A part drying station whereat hot air is blown over the part. The stop interval is 30 seconds.

STATION 32 An unloading station whereat the palletized plating fixture is removed from the transfer mechanism and connected to a conveyor for removal to a part unloading station. The stop interval is 30 seconds.

The machine A new and improved plat-ing machine has been provided to accomplish the aforementioned processing steps. The processing stations are located in line along a longitudinal frame made from structural steel members. Since the machine apparatus is duplicated at many stations, only the first five stations are shown. Furthermore, the various stations are, in general, provided with one or two types of processing apparatus. One type of apparatus is provided at stations where the processing step requires no electrical energization of any of the parts and such stations may be referred to as non-electrical stations. The other type of apparatus is provided at stations where the processing step requires cathodic energization of the workpiece and the energization of an anode member. Such stations may be classified as electrical stations. Non-electrical stations include a shroud housing in which spray apparatus is mounted and electrical stations include an anode housing in which an anode fixture is mounted. The two types of stations are hereinafter referred to, respectively, as shroud stations and anode stations, and one of each type of station will be described in detail by reference to the details of the apparatus at shroud station No. 4 and the details of the apparatus at anode station No. 3, which are exemplary.

Frame and associated parts Referring now to FIGURES 2, 3 and 4, stations 1, 2, 3, 4 and 5 of the plating machine are shown in detail, and it is to be understood that the other stations are similarly constructed. The machine comprises a frame of structural steel construction having a lower tank section which supports process solution tanks, an intermediate section which supports conveyor and transfer apparatus and an upper section which supports plating cell forming housings. As shown in FIGURES 2 and 4, the frame comprises a base formed by spaced horizontally extending lower structural members 50, 52, 53. A plurality of lower vertical structural members 54, 55, 56, 57, 58 extend upwardly from the base and form two spaced longitudinal rows of similarly positioned members. The vertical structural memhers in each row are spaced to define tank accommodating compartments 59, 60, 61 for each of the processing stations. Intermediate horizontally extend-ing structural members 62, 63 are secured to the upper ends of the vertical structural members of each row and support a conveyor platform plate 66 which extends the length of the machine. A row of upper vertically extending structural members 67, 68, '69, 70 extends longitudinally along one edge of the conveyor platform 66 and another parallel row of identically located structural members 71, 72 extend longitudinally along the opopsite edge of the conveyor platform 66. It is to be understood that similar upper vertical members extend the length of the machine. Upper horizontally extending support members 74, 75 are supported on the tops of the upper vertical structural members. Cross support structural members 76, 77 and cross support plates '78, 79, 80 extend transversely between the longitudinally extending structural members 74, 75. In addition, bracket plate members 81, 82 are secured to the 'top of the cross supports 76, 77 and extend longitudinally of the frame. As shown in FIGURES 4 and 5, bracket support plates 83, 84 may be secured to the inner side surfaces of the upper vertical members and extend longitudinally of the frame. A transfer mechanism support frame 85 is positioned adjacent one end of the machine frame and supports a transfer mechanism support platform 86 in substantial alignment with the conveyor platform 66.

Solution tanks, such as tanks 89, 90, 91, illustrated at stations 2, 3 and 4, are provided at some of the stations and are seated in the tank compartments. Conventional pump mechanisms 92, 93, 94 are mounted adjacent each of the tanks as shown in FIGURE 3. At some of the stations, such as station No. 5, an outlet pipe 64 is provided in place of a tank to conduct processing solution to a central drain system. In addition, at the several plating stations, electrolyte regenerating tanks (not shown), are also provided adjacent the apparatus and are connected by suitable piping to the tanks provided beneath each station.

Conveyor means Referring now to FIGURE 3, a longitudinally extending conveyor track is centrally located on the support platform 66 and comprises spaced rows 87, 88 of horizontally aligned roller members 95, 105. The rollers at each nonelectrical station may be mounted on individual support frames 96, 97 which are directly connected to the support platform 66. The rollers at each electrical station are specially mounted and will be hereinafter described in detail. The rollers 95, and roller frame sections 96, 97 of adjacent work stations are parallelly aligned so that a continuous roller conveyor is provided for the palletized plating fixtures. For purposes of illustration, each section of rollers is shown to comprise three individual roller members. Referring now to FIGURE 4, the spaced sections of rollers at each of the non-electrical stations, such as station No. 4, comprise base plates 98, 99 which are secured to the support platform 66 in any suitable manner. Spaced side support plates 100, 101 and 102, 103 are secured to the base pates 98, 99 and extend upwardly therefrom. Suitable cross supports may be provided to divide each roller frame section into three roller compartments as shown in FIGURE 3. Support shafts 106, 107 are centrally located in each roller compartment and rotatably support the roller members 95, 105. As shown in detail in FIGURE 13, the roller members have a V-shaped peripheral cross section which is configured to receive mating portions of each palletized plating fixture during movement of the palletized plating fixtures from station to station.

Referring again to FIGURE 2, at each station where a processing solution is applied to a workpiece on a palletized plating fixture, solution controlling and confining housings 110, 111, 112, 113, 114 are vertically movably supported for movement between a retracted upper position during transfer of palletized plating fixtures from station to station and an extended lower position of sealing engagement with the palletized plating fixtures to form a processing cell during application of processing solution to the workpieces. Anode type housings 111, 114 are provided at electrical stations Nos. 3 and 6, and spray type housings 110, 112, 113 are provided at non-electrical stations Nos. 2, 4 and 5.

Spray housing Referring now to FIGURE 4, each of the spray housings comprises a rectangular casing 115 formed from sheet metal or the like and containing a plurality of spray nozzles 116. The lower portion of the casing is open and provided with a peripheral rim 117 which is adapted to be sealingly engaged with an upper surface of each of the palletized plating fixtures 118. The workpiece mounted on the palletized plating fixture is centrally positioned within the rectangular casing 115 adjacent the spray nozzles 116 when the spray housing is in the extended position. The spray housings are vertically movably supported on pipe members 119, 120 which extend upwardly through support brackets 121, 122 fixed to the angle plates 81, 82 or other adjacent portions of the frame. A spray nozzle pipe 123 is connected to the lower ends of the pipe members. The pipe 123 is connected to a solution source through suitable piping 124 which is integrally connected to one of the support tubes 120.

Anode housing Referring now to FIGURES 5 and 13 where the anode housing 114 at station No. 5 is illustrated, each of the anode housings comprises an outer rectangular casing 128 

1. A METAL FINISHING APPARATUS FOR USE WITH A PALLETIZED CELL COMPONENT MOVABLE ON A CONTINUOUS CONVEYOR FROM STATION TO STATION OF A METAL FINISHING MACHINE, SAID METAL FINISHING APPARATUS COMPRISING TRANSFER BAR MEANS EXTENDING ALONG SAID MEANS TO ENGAGE SAID PALLETIZED CELL SAID TRANSFER BAR MEANS TO ENGAGE SAID PALLETIZED CELL COMPONENT, AND TRANSFER MEANS TO AUTOMATICALLY ENGAGE AND DISENGAGE SAID DOG MEANS FROM SAID PALLETIZED CELL COMPONENT AND SHIFT SAID BAR MEANS ALONG SAID CONTINUOUS CONVEYOR TO MOVE SAID PALLETIZED PLATING FIXTURE FROM STATION TO STATION ON SAID CONTINUOUS CONVEYOR, WHEREIN SAID TRANSFER MEANS COMPRISES CARRIAGE MEANS, TRACK MEANS TO ACCOMMODATE RECIPROCABLE MOVEMENT OF SAID CARRIAGE MEANS, MEANS CONNECTING SAID CARRIAGE MEANS AND SAID TRANSFER BAR MEANS WHEREBY RECIPROCABLE MOVEMENT OF SAID CARRIAGE MEANS IS IMPARTD TO SAID TRANSFER BAR MEANS, POWER MEANS TO RECIPROCABLY DRIVE SAID CARRIAGE MEANS, POWER TRANSFER MEANS CONNECTED TO SAID TRANSFER BAR MEANS WHEREBY THE TRANSFER BAR MEANS ARE SHIFTED DIFFERENT LENGTHS ALONG SAID CONTINUOUS CONVEYOR TO MOVE SAID PALLETIZED PLATING FIXTURE DIFFERENT DISTANCES AT DIFFERENT STATIONS. 